INVESTIGADORES
PLA Juan Carlos
artículos
Título:
Ultrathin µc-Si films deposited by PECVD
Autor/es:
R. RIZZOLI; C. SUMMONTE; J. PLA; E. CENTURIONI; G. RUANI; A. DESALVO; F. ZIGNANI
Revista:
THIN SOLID FILMS
Editorial:
Elsevier
Referencias:
Año: 2001 vol. 383 p. 7 - 10
ISSN:
0040-6090
Resumen:
The crystalline fraction of microcrystalline silicon films 18-200 nm thick, deposited by VHF plasma and by chemical transport deposition (CTD) was characterized by Raman and optical measurements. On a p-type CTD sample, thinner than 20 nm, a crystalline fraction as large as 78%, to our knowledge the largest obtained by VHF plasma on p-type films in this thickness range,was measured. Transmission electron microscopy shows crystallites extending to the interface with the substrate. Electrical conductivities in the range 10¨-2-10¨0 S/cm and 10¨-1-10¨1 S/cm after annealing at 250 C were measured. Weak dependence of crystalline fraction and electrical properties on thickness was observed.
