Silver nanowires in poly(methyl methacrylate) as a conductive nanocomposite for microfabrication

EDUARDO D. MARTINEZ; JAVIER H. LOHR; MARTÍN SIRENA; RODOLFO D. SÁNCHEZ; H. PASTORIZA

Flexible and Printed Electronics

IOP

Año: 2016 vol. 1

2058-8585

A novel nanocomposite resist is presented based on AgNWs dispersed in poly(methyl methacrylate).It is shown that this nanocomposite resist displays sheet resistances below 10 Ω sq−1 for concentrationsof AgNWs higher than 4%wt and can be used for a wide range of microfabrication techniques.The resist can act as a conductive ink that cures at room temperature, form thin films with low sheetresistances, and be used in fast replication methods derived from soft lithography. Furthermore, it canbe applied for nano-scale fabrication via electron beam lithography (EBL) on different substrates,including flexible and insulating materials, providing a straightforward method to avoid chargingeffects. This, being the first report about a nanocomposite resist based on AgNWs for EBL, describes asimple procedure to account for suspended nanowires, forming bridges, nanocantilevers and morecomplex nanostructures. A wide range of opportunities opens for the single-step fabrication ofelectronic components in the nano and micro scale.