INVESTIGADORES
ARCE roberto Delio
artículos
Título:
EFFECT OF THE DEPOSITION VARIABLES ON AMORPHOUS SILICON STABILITY
Autor/es:
R.D. ARCE; R.R. KOROPECKI; M. CUTRERA; R. BUITRAGO
Revista:
JOURNAL OF NON-CRYSTALLINE SOLIDS
Editorial:
ELSEVIER SCIENCE BV
Referencias:
Lugar: Amsterdam; Año: 1993 vol. 164 p. 259 - 262
ISSN:
0022-3093
Resumen:
The influence of R.F. frequency and Hydrogen dilution in the PECVD of a-Si:H has been studied.
Results are expressed in terms of Staebler-Wronki susceptibility.
