Electron beam induced deposition of carbon films on Cu(111)

CARLOS SILVA; SILVIA MONTORO; FERNANDO BONETTO; RICARDO A. VIDAL; J. FERRÓN

Foz de Iguazú

Congreso; XXXVIII Encontro Nacional de Física da Matéria Condensada; 2015

Sociedad Brasilera de Física

Electron-beam-induced deposition (EBID) and dissociation is a well-known process. The use of focused electron beams allows the fabrication of nanostructures that might be of technological interest (e.g. in the semiconductor industry). Among the different materials developed in numerous practical applications, using different precursors, carbon deposits are important for many prospective electronic applications. As it is well known, carbon can exist in different forms related to different hybridizations. Therefore, the electronic properties range frominsulating/semiconducting to metal like (graphite, graphene, etc) depending on the sp3/sp2 content and the nanostructure morphologies of the carbon material. In the work reported here, we present preliminary results of the electron-beam-induced deposition (EBID) of carbon on the surface of a Cu(111) crystal by using ethylene as a precursor. The molecules adsorbed on the surface, coming from the background (1x10-7 Torr), are decomposed by electrons impinging the surface at energies ranging from 50 to 1000eV, generated by a hot tungsten filament positioned close to the crystal. We studied the chemical properties of the resulting carbon film, as well as its evolution with the dose of ethylene and annealing temperature after dosing, by Auger electronspectroscopy (AES) (line-shape analysis). Electron energy loss spectroscopy (EELS) allowed us to estimate the sp3/sp2 content.