INTECIN   20395
INSTITUTO DE TECNOLOGIAS Y CIENCIAS DE LA INGENIERIA "HILARIO FERNANDEZ LONG"
Unidad Ejecutora - UE
congresos y reuniones científicas
Título:
AgGeSe thin films deposited by PLD under vacuum conditions
Autor/es:
J. M. CONDE GARRIDO; J. M. SILVEYRA; J. BOBADILLA
Lugar:
Bilbao
Reunión:
Conferencia; X Iberian Vacuum Conference, RIVA X; 2017
Resumen:
Pulsed laser deposition (PLD) is a technique for fabricating thin films that, because of its simplicity, offers great experimental versatility. It allows the stequiometric transfer of mass from the target to the substrate and the physical properties of the films are, in many cases, superior to those obtained by other techniques.The main limit for the application of PLD in micro/nano-devices is the presence of particulate at the surface of -and sometimes even inside- the films.In this work, we deposited thin films by PLD under vacuum conditions of the AgGeSe system on Si wafers. We tested various deposition parameters (including deposition time, target-substrate distance, and fluence) and studied the films through SEM. We present the dependence of the number of particulates and their sizes on the deposition parameters.We examined the targets after ablation and found that the largest particulates originate from the tips of the cones that form at the target?s surface during the ablation.