Pressure effect on optical and structural properties of ZnMnO thin films grown by pulsed laser deposition

SALCEDO, K.L.; RIASCOS, H.; ÁVILA-TORRES, Y.

Materials Today: Proceedings

Elsevier Ltd

Año: 2019 vol. 14 p. 109 - 112

2214-7853

Zn0.95Mn0.05O thin films were deposited on Si substrate by pulsed laser ablation technique under different oxygen pressure. Thestructural and optical properties of the films were analyzed as a function of the oxygen gas pressure. The Mn concentration andthe substrate temperature of the thin films were kept constant at 5 wt% and 200°C respectively. X-ray diffraction technique(XRD), atomic force spectroscopy (AFM), raman spectroscopy and UV-Vis were employed to characterize the optical propertiesand the crystalline structure of the films. The diffraction patterns revealed that the Mn0.05Zn0.95O thin films were polycrystallinewith the wurtzite hexagonal structure of ZnO and highly oriented in c-axis direction, without any secondary phases. The averageenergy band gap of the films was evaluated around 3.23-3.56 eV. Raman spectrum showed E2 (low) mode of ZnO structureshifted to red and increased its FWHM.