IFLP   13074
INSTITUTO DE FISICA LA PLATA
Unidad Ejecutora - UE
artículos
Título:
Preparation and characterization of nanostructured titanium nitride thin films at room temperature
Autor/es:
F. SOLIS-POMAR; O. NÁPOLES; O. VÁZQUEZ ROBAINA; C. GUTIERREZ-LAZOS; A. FUNDORA; ANGEL COLIN; E. PÉREZ-TIJERINA; M.F. MELENDREZ
Revista:
CERAMICS INTERNATIONAL
Editorial:
ELSEVIER SCI LTD
Referencias:
Lugar: Amsterdam; Año: 2016 vol. 42 p. 7571 - 7575
ISSN:
0272-8842
Resumen:
Nanostructured TiN thin films were grown by reactive magnetron sputtering deposition on Si (100) substrate at room temperature. The nanostructured TiN thin films were characterized by X-ray Diffraction (XRD), X-ray Photoelectron Spectroscopy (XPS), Scanning Electron Microscopy (SEM), Scanning Tunneling Microscopy (STM), Atomic Force Microscopy (AFM), resistivity and hydrophobicity tests. The nanostructured TiN thin films had an average grain size 4.6 nm, an average roughness of 1.3 nm, a preferential orientation in the [111] direction and also they showed hydrophobicity Type I.