INVESTIGADORES
URTEAGA Raul
congresos y reuniones científicas
Título:
Capillary filling in nanostructured porous silicon
Autor/es:
LEANDRO N. ACQUAROLI; RAÚL URTEAGA; CLAUDIO L. A. BERLI; R.R. KOROPECKI
Reunión:
Workshop; PASI in Scalable, Functional Nanomaterials; 2011
Institución organizadora:
PAN-AMERICAN ADVANCED STUDIES INSTITUTE
Resumen:
Thin film porous silicon (PS) material can be obtained by electrochemical anodization of doped crystalline silicon (c-Si) wafers in a fluorine containing solution. Under certain preparation conditions a porous net grows in depth with remanent nanostructures preferentially aligned to the (100) crystalline direction. PS characteristic sizes can be controlled in a wide range (from nm to μm) with appropriate operational parameters [1]. Since the anodization process is self-limited, a current density versus time profile transforms into a porosity profile, allowing to fabricate PS multilayers. This self-limited characteristic also provide the possibility to separate the PS layer from its original c-Si substrate after fabrication, and transfer it, for instance, to transparent glasses substrates [2], in which is so-called an electropolishing process. In this work we present the study of capillary filling in PS single layers fabricated with different current densities. From reflection measurements and using a capillary flow model for an assembly of channels [3], the characteristic parameters of the liquids and information about the porous matrix of the thin film layers are obtained.