ELABORACIÓN MEDIANTE PECVD DE PELÍCULAS DE TIO2 PARA USO EN FOTOCATÁLISIS

N. DI LALLA; C. LASORSA; P. PINEDA RAMOS

Viña del Mar

Congreso; 12° Congreso Binacional de Metalurgia y Materiales; 2012

We present the first results in the production of films of titanium dioxide (TiO2) deposited by Plasma enhanced chemical vapor deposition (PECVD). The films are destined for use in photocatalysis for water treatment. The deposits were made on glass from titanium isopropoxide as precursor (Ti [OCH (CH3) 2] 4) and a controlled flow of O2. The films were grown at room temperature and 300 ° C to compare properties. The characterization of the deposits was performed using scanning electron microscopy, UV-visible transmittance and infrared absorbance. The deposits were obtained with very good adhesion to substrates showing energy values of band gap of 2.83 eV.