REE PROFILING IN VOLCANIC BASALTS AFTER ULTRASONIC SAMPLE TREATMENT AND ICPMS ANALYSIS WITH OXIDE ION FORMATION IN ICP ENRICHED WITH O2

LONDONIO, AGUSTÍN ; PERINO, ERNESTO; VERNI, ERNESTO RICARDO; STRASSER, EDGARDO NÉSTOR ; BAZÁN, CRISTIAN; GIL, RAUL ANDRES

MICROCHEMICAL JOURNAL

ELSEVIER SCIENCE BV

Lugar: Amsterdam; Año: 2016 vol. 130 p. 14 - 20

0026-265X

ICP-MS methods, and its variants, had been extensively used to determine REEs due to their lower detection limits, high sensitivity and dynamic linear range. However, spectral interferences caused by oxide and hydroxide ions always represents an issue regardless the type of sample been dealt. In the present work it was described the study of REEs oxides formation with the introduction of an auxiliary line directly to the cyclonic chamber to generate a mix Ar/O2 plasma. Plasma conditions were optimized by studying and selecting the best flow rates to induce the formation of REEs oxides. A new analytical method for REE determination was thus proposed using ICPMS with Ar-O2 mixed plasma to aid the formation of MO ions. This method was validated through CRM analysis and through the analysis of real-world samples. The REE concentrations evaluated and normalized to chondrite REE levels allowed the analysis of basaltic rocks study in terms of their origin.