IFEG   20353
INSTITUTO DE FISICA ENRIQUE GAVIOLA
Unidad Ejecutora - UE
congresos y reuniones científicas
Título:
Comparison of Grazing Incidence X-Ray Fluorescence and X-ray Reflectivity Data Obtained at the XRF-Beamline of the Elettra Sincrotrone Trieste and an Optimized Lab Spectrometer
Autor/es:
D. INGERLE; G. PEPPPONI; JUAN JOSÉ LEANI; A. KARYDAS
Lugar:
Denver
Reunión:
Congreso; International Conference on Total Reflection X-ray Fluorescence Analysis and Related Methods (TXRF).; 2015
Institución organizadora:
International Centre for Diffraction Data
Resumen:
Grazing Incidence XRF (GIXRF) analysis is a sensitive technique able to provide information aboutthe elemental composition, concentration profile and thickness of near surface layers. The technique istypically used for the characterization of impurities or thin film structures in or on semiconductorsurfaces. As the penetration depth of the incident X-ray beam in the total-reflection regime is verysmall, i.e. in the order of only a few nanometers, the XRF spectra represent the elementalconcentrations of this near surface region. Varying the angle of incidence in the grazing incidentregime and collecting XRF spectra at several angle positions results in angle dependent intensity curvesfor each element, which contain information on depth distribution and mass density of the elements inthe sample. By fitting calculated curves to these experimental data, density and thickness of layers ordepth distributions of implanted atoms can be determined in the near surface region. Above the surfaceof the reflector an X-ray Standing Wave (XSW) is formed due to the interference between incident andreflected beam. This XSW field with its angle dependent distance in the nanometer range betweennodes and antinodes can be used for the characterization of nanostructures on the surface.X-ray reflectometry (XRR) is an established technique for the characterization of single- and multilayeredthin film structures with layer thicknesses in the nanometer range. XRR spectra are acquired byvarying the incident angle in the grazing incidence regime while measuring the intensity of the specularreflected x-ray beam. The shape of the resulting angle-dependent curve is correlated to changes of theelectron density in the sample.The recently commissioned multipurpose X-ray spectrometry end-station provided by InternationalAtomic Energy Agency (IAEA)[1] located at the new X-Ray Fluorescence beamline developed byElettra Sincrotrone Trieste[2] allows for combined GIXRF and XRR measurements. In order toevaluate the capabilities of this new setup, several samples have been successively measured at the labspectrometer available at the Atominstitut in Vienna, which has already been used successfully on awide range of samples[3][4], and at the IAEA spectrometer. The measured samples include Ti and Aulayers with thicknesses in the nanometer range on Silicon substrate as well as nanoparticles with anapproximate size of 10 nanometers. The measurements were performed at 8.04 keV corresponding toCu-Kα, in order to facilitate the comparison between synchrotron and laboratory.A comparison of the performance of the spectrometers with respect to GIXRF and XRR measurementswill be presented. Moreover, simulations and evaluations, which were performed using JGIXA, will beshown.