Characterization of amorphous carbon films grown by a vacuum arc discharge

M. FAZIO; E. HALAC; I BORSA SAN JUNA; F. ROSSO; A. MARQUEZ

Congreso; Plasma Based Ion Implantation and Deposition 2015; 2015

Amorphouscarbon films with diamond-like bonds have been widely studied due to theirinteresting physical and chemical properties, such as high hardness, low staticand dynamic friction coefficient, optical transparency, high thermalconductivity and biocompatibility. In this work non hydrogenated amorphouscarbon (a:C) films grown by a dc vacuum arc discharge were studied. The arc wasproduced between a high purity graphite cathode of 8 cm diameter and the vacuumchamber that acted as the anode. The discharge produced a carbon plasma thatcondensed on a floating substrate. The arc current was run at 75 A, and a linearmagnetic filter was used to avoid the presence of macroparticles on thecoatings. The films were grown on M2 high speed steel, 316L stainless steel andsilicon substrates. In order to improve the adhesion of the coatings to the steelsubstrates, a Ti interlayer grown by vacuum arc was introduced. The efficiencyof the magnetic filter was evaluated, and the effect of the Ti layer on theadhesion and structure of the coatings was studied. The structure of the filmswas analyzed by Raman spectroscopy and the morphology by scanning electronmicroscopy.