INTEMA   05428
INSTITUTO DE INVESTIGACIONES EN CIENCIA Y TECNOLOGIA DE MATERIALES
Unidad Ejecutora - UE
congresos y reuniones científicas
Título:
Structure of Ti thin films deposited with a vacuum arc as a function of the thickness
Autor/es:
M. FAZIO; D. VEGA; A. KLEIMAN; D. COLOMBO; L.M. FRANCO ARIAS; A. MÁRQUEZ
Lugar:
Buenos Aires
Reunión:
Conferencia; 13th International Conference on Plasma Based Ion Implantation & Deposition, PBII&D 2015; 2015
Institución organizadora:
Instituto de Física del Plasma (INFIP) - CONICET/UBA
Resumen:
Polycrystalline titanium thin filmshave been widely employed as interlayer between the substrate and differentcoatings to promote the growth of crystalline phases and to improve adhesionstrength, corrosion resistance and wear performance. However, very few studieshave been carried out on the influence of the thickness of the Ti films on itscharacteristics.In this work, the crystal structure of Ti filmsdeposited on silicon (100) with a vacuum arc was studied and a dependence onthe film thickness was found. The presence of the fcc phase of Ti was observedup to a critical thickness of 300 nm, a much larger value than reported forother deposition processes. For larger thicknesses, the films exhibited theusual α phase with a preferred orientation in the [100] direction. Theseresults agree with a growth model based on the matching between the film andsilicon the substrate lattice. Recently, evidence of the fcc phase was alsofound on Ti thin films grown on polycrystalline substrates of 316L stainlesssteel.