Degradation of Bisphenol A by UV/H2O2 Process: a Kinetic Study

PIERRE PICHAT; CONTE, L.O.; SCHENONE, A.V.; ARAUJO, L.G.; ALFANO, O.M.; GRACIANO, J.E.A.

Conferencia; 3rd Iberoamerican Conference on Advanced Oxidation Technologies (III CIPOA); 2017

This study is aimed at proposing a kinetic model for bisphenol A (BPA) degradation by the UV/H2O2 process. The experiments used to validate the model were performed in an annular photochemical reactor in batch recirculation mode. The effects of H2O2 initial concentration and specific rates of photon emission were evaluated. The mole balances were derived from an established reaction mechanism, considering the local volumetric rate of photon absorption inside the photoreactor. By the nonlinear regression method, the second-order kinetic parameters for H2O2 and BPA attack by hydroxyl radicals were estimated (k2 = 3.40 L mol-1 s-1 × 107 and k7 = 1.84 × 109 L mol-1 s-1, respectively). The results showed good agreement between experimental and predicted data, indicating that the proposed kinetic model was able to reproduce the time profiles of both BPA and H2O2 concentrations.