Kinetics of arsenic (III) oxidation employing the UV/H2O2 process

LESCANO, M.; ZALAZAR, C. S.; CASSANO, A. E.; BRANDI, R. J.

Porto

Encuentro; 6° European Meeting on Solar chemistry and photocatalysis: environmental applications (SPEA 7); 2012

The oxidation of arsenic (III) in aqueous solutions employing the UV/H2O2 process was reported in this work. A mathematical model was derived from a simple proposed reaction sequence to represent the kinetics of arsenic oxidation. The model was validated its predictive quality with the experimental data. Experiments were carried out in a cylinder reactor (in a recirculation batch mode) made of Teflon and radiant energy was supplied by two 40 W tubular germicidal lamps (ë = 254 nm. Experimental runs were performed by varying the H2O2 concentration, and incident radiation. The simplify model has only three parameters (two known and the other unknown). Good agreement was obtained between model predictions an experimental data as a first approach in the study of arsenic oxidation.