DEGRADATION OF CHLORPYRIFOS FORMULATION IN WATER BY THE UV/H2O2 PROCESS: LUMPED KINETIC MODELLING OF TOTAL ORGANIC CARBON REMOVAL

LÓPEZ, ALEJANDRO; ROBERTO ROMERO; LESCANO, MAIA; ZALAZAR, CRISTINA

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY

ELSEVIER SCIENCE SA

Lugar: Amsterdam; Año: 2020 vol. 404

1010-6030

The degradation of a commercial chlorpyrifos (CP) formulation solution under theUV/H2O2 process was predicted through a lumped kinetics modelling approach (LKA).The proposed models are based on different reaction schemes that include the hydroxylradical reaction rate with the Total Organic Carbon (TOC). TOC represents theconcentration of the mixture of CP and ?unknown organic matter?, both componentspresent in CP formulation. TOC is one of the most practical parameter that can be usedto quantify organic pollution in a complex matrix. A one-step model was selected and asecond-order reaction rate constant between hydroxyl radical and TOC was obtained byoptimization: 1.75×107 M-1s-1. According to computed performance metrics, the chosenmodel well fitted the concentrations evolution of the reactants (TOC and H2O2). Themodel could be useful to predict the behaviour of reaction systems with differentconfiguration for wastewater treatment applications.