INTEC   05402
INSTITUTO DE DESARROLLO TECNOLOGICO PARA LA INDUSTRIA QUIMICA
Unidad Ejecutora - UE
artículos
Título:
Reversible Ion Induced Modification of Consequent Secondary Electron
Autor/es:
G. D. RUANO; J. FERRÓN; R. R. KOROPECKI
Revista:
The Open Surface Science Journal
Editorial:
Bentham Science Publishers Ltd.
Referencias:
Lugar: Bussum-The Netherlands; Año: 2009 vol. 1 p. 46 - 49
ISSN:
1876-5319
Resumen:
We report measurements of secondary electron emission (SEE) induced by electron and ion bombardment on porous silicon (PS). We found that electron induced emission is strongly reduced by ion bombardment, and that thisreduction is reversible. The reduction effect is large even for ion fluxes much lower compared to that of the electron beam.We attribute this effect to changes in the charge distribution of the surface dipole originated in the difference between ion and electron charge deposition depths. The nanostructure of PS plays an important role in this effect as well as in the reversibility of the process. We think that this effect could be useful in the dynamic centering and monitoring of ion and electron beams in electron spectroscopy.