Modeling surface morphology after deposition, adsorption, and etching in Si(100)

C. M. ALDAO

Cuernavaca, México

Conferencia; The Fourth San Luis Summer School and Symposium on Surfaces, Interfaces and Catalysis; 2007

A variety of processes can be responsible for the morphology of surfaces in equilibrium or after the addition or the removing of material.  We focus on Si(100), the surface used in making chips, to explore the effects of a variety of experiments.  In particular, we study homoepitaxial at submonolayer coverages, surface roughening due to adsorbates, and wet etching.  Monte Carlo simulations are used to explore the consequences of the proposed basic mechanisms.