Formation dynamics of hillocks during etching

D. A. MIRABELLA, M. P. SUÁREZ, Y C. M. ALDAO

Cuernavaca, México

Congreso; The Fourth San Luis Summer School and Conference on Surfaces, Interfaces and Catalysis; 2007

Etch hillocks formation was studied experimentally and modeled using the Monte Carlo method.  Simulations were used to explore the consequences of site-dependent detachment probabilities on surface morphology for a two-dimensional etching model.  Resulting hillock size distribution in steady-state are determined, and the responsible mechanisms involved are proposed and their interrelation explained.  Comparison with pyramidal etch hillocks that are regularly observed in anisotropic etching of Si(100) are presented.